Speaker
Description
Photopolymerization offers excellent spatial resolution, low energy consumption and high curing speeds, making it a widely used industrial technology with great potential in additive manufacturing application. The kinetics of spatial and temporal nanostructural evolution and the interfacial formation in resin multilayers are the key to achieve controllable and high-precision manufacturing. In detail, the photopolymerization-induced transformation of resins from as-deposited to solid and cross-linked state needs to be correlated to the physical transformations. Here, we use spin-coated UV-curable multilayer films as research model. We investigate the kinetics of the nanostructure and interfacial evolution by modulating precursor resin components (solvents, active diluents, and glass temperature conditioning agents). Combining atomic force microscopy (AFM), scanning electron microscopy (SEM), and grazing incidence small angle X-ray scattering (GISAXS), the UV-curing induced nanoscale morphology as well as the buried interlayer interface of the multilayer films are probed. We reveal the kinetics of solvent- and reactive diluent-induced interface evolution in photocurable multilayer film fabrication. This paves the way for sub-micrometer additive manufacturing with high precision and controlled nanomorphology.
